| Customization: | Available |
|---|---|
| After-sales Service: | Online |
| Warranty: | 1 Year |
|
Still deciding? Get samples of US$ 3000/Piece
Request Sample
|
Suppliers with verified business licenses
Audited Supplier Audited by an independent third-party inspection agency
Plasma Cleaner Laboratory Plasma Cleaning Machine Laboratory 300W 40KHz 5L Square Chamber Vacuum Plasma Cleaning Equipment
Pre-Treatment ProcessesPlasma Cleaning Technology
Plasma cleaning technology is performed before many processes and can achieve results with half the effort. The more commonly used processes include:
Based on its inherent characteristics, it is widely applied to:
Electronic Industry:
Packaging Industry:
Printing Industry:
Automotive Industry:
Plastic Industry:
Other Industries:
Plasma Cleaner Laboratory Plasma Cleaning Machine Laboratory 300W 40KHz 5L Square Chamber Vacuum Plasma Cleaning Equipment
Principle of Vacuum Plasma Glow Discharge
The device that generates plasma in plasma cleaning etching machines operates by setting up two electrodes in a sealed chamber to form an electric field, and a vacuum pump is used to achieve a certain degree of vacuum. As the gas becomes increasingly rarefied, the distance between molecules and the free path of molecules or ions also becomes longer. Under the influence of the electric field, they collide and form plasma. These ions are highly reactive, with enough energy to break almost all chemical bonds, causing chemical reactions on any exposed surface. Plasma of different gases has different chemical properties; for example, oxygen plasma has a high degree of oxidizing ability, capable of oxidizing photoresist to form reaction gases, thus achieving the cleaning effect; corrosive gas plasma has good anisotropy, which can meet the needs of etching. Plasma treatment emits a glow, hence it is called glow discharge treatment.
Plasma Cleaner Laboratory Plasma Cleaning Machine Laboratory 300W 40KHz 5L Square Chamber Vacuum Plasma Cleaning Equipment
Small vacuum plasma cleaning machine
| Model | PT-5S |
| Chamber Material | Stainless steel with surface treatment |
| Power Supply | AC220V |
| Working Current | The total working current of the machine is not greater than 1.2A (excluding the vacuum pump) |
| RF Power Supply Power | 0-300W adjustable |
| RF Frequency | 40KHz (with a deviation of less than 0.2KHz) |
| Frequency Deviation | Less than 0.2KHz |
| Vacuum Level | 1pa-100Pa |
| Characteristic Impedance | 50 ohms, automatically matched |
| Gas Path | 6-8 inch wafers, process gases |
| Gas Flow Rate | 10-160ml/min (adjustable) |
| Process Control | PLC human-machine interface with automatic and manual modes |
| Cleaning Time | 1-9999 seconds adjustable |
| Power Level | 10%-100% adjustable |
| Inner Chamber Dimensions | 150*270 Lmm, 5L |
| External Dimensions | 560×540×410 mm |
| Vacuum Pump | Feiyue pump VRD-8 |
| Vacuum Chamber Temperature | Less than 30°C |
| Cooling Method | Forced air cooling |
| Model Numbers | PT-2S | PT-5S | PT-10S | PT-10SZ |
| Chamber Material | 316 Stainless Steel with surface treatment | |||
| Chamber Dimensions | Φ100×270L mm | Φ150×270L mm | 220×260×200 mm (L×W×H) | |
| Chamber Capacity | 2L | 5L | 10L | |
| Electrode Plate | Single layer | Double layer | ||
| External Dimensions | 560×540×410 mm (L×W×H) | 560×540×410 mm (L×W×H) | 650×550×440 mm (L×W×H) | |
| Power Supply Frequency | 40KHz | |||
| Power Supply Power | 0-300W (continuously adjustable) | |||
| Flowmeter | High-precision dual float flowmeter | |||
| Vacuum Gauge | Pressure gauge (with quantified value display) | |||
| Control Process | Fully automatic control and manual (PLC human-machine interface) | |||
| Cleaning Time | 0-9999S adjustable | |||
| Vacuum Level | 1-30pa | |||
| Chamber Temperature | <60ºC | |||
| Power Supply Voltage | 220V | |||
| Vacuum Pump | 2XZ-2 (pumping speed 2L/S) | 2XZ-4 (pumping speed 4L/S) | ||
){kind=link}